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User Information : Equipment Classification
LevelArea ToolUsage
Base Lithography CEE Resist Developer For Development of positive photoresists using TMAH based chemistries
Base Lithography CEE Resist Spinner Hand coating photoresist
Base Lithography SCS Resist Coater Hand coating of photoresists
Base Lithography SSI Track 150mm Positive Photoresist Coat/Develop
Base Lithography Suss MA 150 Aligner 1x Contact Aligner - 100,125,150mm Wafers with 5x5 or 7x7 Mask
Base Lithography Suss MA55 Contact Aligner Contact printing on 100mm and smaller substrates
Base Lithography SVG Track 100mm Positive Photoresist Coat/Develop
Base PVD CHA Ebeam Evaporator Ebeam Evaporation
Base PVD CHA Flash Evaporator Flash Evaporation of Al
Base PVD CVC 601 Sputter DC Sputter Deposition
Base PVD CVC Thermal Evaporator Thermal Evaporation
Base PVD Denton Sputter SEM sample preparation sputter tool
Base PVD Nanomaster NSC 2000 Research Sputter tool
Base PVD PE2400A Sputter RF Sputter Deposition - Research Tool
Base PVD PE2400B Sputter DC Sputter Deposition - Research Tool
Base Plasma Etch Branson Asher Oxygen ash of Photoresist
Base Plasma Etch GaSonics Aura 1000 Asher Oxygen ash of photoresist on III-V and Au substrates
Base Plasma Etch LAM 490 Plasma etch of nitride and polysilicon
Base Plasma Etch Trion Etcher For reactive ion etching of silicon and polysilicon
Base Plasma Etch Xactic Etcher Isotropic dry etch of silicon - for release
Base Thermal / Implant AG 610A RTP Rapid thermal processing of 150mm substrates - General Use
Base Thermal / Implant Bruce 1 - Tube 1 Thermal Oxide - Wet - 1000C
Base Thermal / Implant Bruce 1 - Tube 2 Thermal Oxide - Wet & P Diffusion - 1000C
Base Thermal / Implant Bruce 1 - Tube 3 Thermal Oxide - Wet & N Diffusion - 1000C
Base Thermal / Implant Bruce 1 - Tube 4 Thermal Oxide - Dry - 1100C
Base Thermal / Implant Bruce 2 - Tube 5 Thermal Oxide - External Torch
Base Thermal / Implant Bruce 2 - Tube 6 Thermal Oxide - 150mm Wet
Base Thermal / Implant Bruce 2 - Tube 7 100mm Low Temp Anneal
Base Thermal / Implant Bruce 2 - Tube 8 High Temp Dry - 1200C
Base Thermal / Implant Heraeus Vacuum Oven Used for heating of substrates under 300mTorr Vacuum - up to 350C under vacuum
Base CVD SMFL Parylene Parylene Depostion
Base Wet Etch Wet Bench - Al Etch and Solvent Strip Wet Bench with Al Etch Bath, Solvent Strip & Sink/Rinse Tank
Base Wet Etch Wet Bench - BOE and Pad Etch Wet Bench with BOE & Pad Etch, Sink & cascade rinsers
Base Wet Etch Wet Bench - Manual Process 1 Manual Processing and general use
Base Wet Etch Wet Bench - Manual Process 2 Manual Processing and general use heated bath - sink and cascade
Base Wet Etch Wet Bench - Manual Process 3 Manual Processing and general use
Base Wet Etch Wet Bench - Manual Process 4 Manual Processing and general use
Base Wet Etch Wet Bench - Nitride and Silicon Etch Wet Bench with Heated Phosphoric Nitride Etch & Heated KOH Silicon Etch
Base Wet Etch Wet Bench - RCA General Clean Wet Bench with Non-critical RCA Clean
Base Wet Etch Wet Bench - RCA MOS Clean RCA Clean - Critical MOS
Base Wet Etch Wet Bench - Ultrasonic Wet Bench with Ultrasonic Tank for cleaning & approved liftoff processes
Base Metrology CDE Res Map Used for mapping of resistivity and sheet res
Base Metrology Leica Inspection Station Microscopic Inspection with image capture
Base Metrology Leitz Inspection Station Optical Linewidth measurement
Base Metrology Nanometrics Spectrophotometer Noncontact optical flim thickness measurement - Resist, oxide, nitride, poly on oxide
Base Metrology Prometrix SpectraMap Noncontact optical flim thickness measurement & mapping - Resist, oxide, nitride, poly on oxide
Base Metrology Rudolph IV Ellipsometer Ellipsometer for film thickness measurement
Base Metrology Surface Charge Analyzer Measurement of surface charge
Base Metrology Tencor P2 Profilometer for step height measurement
Base Metrology Tencor Surfscan 364 Particle measurement on silicon wafers
Base Metrology Woollam VASE Variable angle spectroscopic Ellipsometer
Base Metrology Wyko Profiler Optical profiling of a surface
Base Metrology Wyko_Dynamic_Optical_Profiler Optical profiler for thin films
Base CMP / Packaging Ecomet Grinder Thinning of substrates
Base CMP / Packaging KS780 Dicing Saw Dicing of up to 150mm wafers/substrates
Base CMP / Packaging Strausbaugh CMP CMP / Polishing of Metals
Base CMP / Packaging Tempress 4 Inch Wafer Saw Dicing of 100mm Substrates
Upper STS ASE DRIE Deep RIE of Silicon
Upper Lithography ASML Stepper 5X i-line exposure tool
Upper Lithography GCA Stepper 5X g-line exposure tool
Upper Lithography MEBES III Electron Beam Exposure
Upper PVD Anatech Sputter Table Top Sputter for Carbon SEM coats
Upper PVD PE4400 Sputter RF Loadlock Sputter Deposition - Research Tool
Upper Plasma Etch Drytek Quad Dry etching of oxide, nitride, polysilicon, deposition of DLC
Upper Plasma Etch LAM 4600 Al Etcher Dry etching of metals
Upper Thermal / Implant Varian 350D Implanter Ion Implantation
Upper CVD AME P5000 Chamber A PECVD TEOS Oxide Deposition
Upper CVD AME P5000 Chamber B PECVD Deposition of Nitride
Upper CVD AME P5000 Chamber C RIE of Oxide
Upper CVD ASM LPCVD Tube 1 Deposition of LPCVD LTO
Upper CVD ASM LPCVD Tube 2 Deposition of nitride and polysilicon
Upper Metrology Amray 1830 SEM Scanning Electron Microscope - LaB6
Last Updated: June 12, 2012
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